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Cressington Scientific

放大字体  缩小字体 2021-10-18
  • 品牌名称:Cressington Scientific
  • 公司名称:BIOMETER
  • 官方主页:暂无
  • 所在地区:进口
品牌介绍

克雷辛顿公司最初成立于1973年,提供高真空涂层领域的产品设计服务。1977年,该公司开始生产和销售一系列产品。

这些早期涂层产品旨在沉积超薄层,用于透射电子显微镜(TEM)中的样品制备。紧凑型电子束(EB)蒸发源、超稳定电子束电源和模块化冷冻蚀刻配件主要用于分子生物学研究。他们还发现了在食品和涂料开发中的应用。

当克雷辛顿从模块化配件转向制造成套设备时,它是在冷冻蚀刻领域。第一套完整的冷冻蚀刻系统(CFE-40)于1986年交付给位于伊利诺伊州埃文斯顿的西北大学。该装置最近被转移到马萨诸塞州波士顿的东北大学,目前仍在使用。

1991年,随着台式“108”系列镀膜机的推出,克雷辛顿进入了更广阔的扫描电子显微镜(SEM)涂层市场。这些高效的低真空溅射镀膜机和碳蒸发器被证明非常受欢迎。随着时间的推移,它们得到了改进和发展,仍然大量销售。

Cressington 108涂布机系列的引入突出了对精确且廉价的薄膜厚度监测器的需求。MTM-10的开发成功地满足了这一要求。超过30%的克雷辛顿台式低真空镀膜机配备了厚度监视器。

1993年,台式镀膜机的范围扩大到包括一台高真空溅射镀膜机(208HR)和一台高真空碳蒸发器(208C)。随着高分辨率FE-SEM使用的增加,这些涂布机的市场仍在增长。208HR被视为FE-SEM溅射涂层的行业标准。

1999年推出了一种新的涂布机,它具有流行的12英寸腔室尺寸(308R)。308R的高度适应性格式立即应用于FE-SEM和TEM的高级样品制备以及薄膜研发的许多领域。这种镀膜机是不寻常的,它能够在一次真空循环中结合溅射和高真空蒸发。308R的附件和腔室形式的范围是正在开发的主题。

克雷辛顿目前提供多种台式涂布机。溅射镀膜机范围从用于SEM的简单低真空镀金机到用于研发的复杂高真空多头溅射镀金机。蒸发器的范围从低真空碳涂层机到混合电子束和电阻源的多材料涂层机。尽管冷冻蚀刻技术已不再广泛使用,但它仍然可以为专业研究人员提供显著的优势,并且当前的桌面模型仍然可以根据特殊要求提供。

克雷辛顿致力于持续的研究和产品开发计划,以提高涂料系列的性能。最新的308R提供涡轮泵和低温泵的组合,在10-8mb的高范围内提供极限压力。初步试验表明,这种超清洁和超干燥的真空环境对溅射层的性能有显著的好处。

The Cressington company was originally formed in 1973 to offer a product design service in the field of high vacuum coating. In 1977 the company commenced manufacturing and marketing a range of products.

These early coating products were designed to deposit ultra-thin layers for sample preparation in transmission electron microscopy (TEM). The compact electron beam (EB) evaporation sources, ultra-stable EB power supplies and modular freeze-etch accessory were intended primarily for use in molecular biology research. They also found applications in the development of foods and paints.

When Cressington moved on from modular accessories to manufacturing complete equipment it was in the field of freeze-etch. The first complete freeze-etch system (a CFE-40) was delivered to Northwestern University in Evanston, Il in 1986. This unit was recently relocated to Northeastern University in Boston, MA where it is still in use.

In 1991 Cressington moved into the wider market of coating for scanning electron microscopy (SEM) with the introduction of the desktop "108" series of coaters. These efficient low vacuum sputter coaters and carbon evaporators proved extremely popular. They have been improved and developed over time and still sell in large numbers.

The introduction of the Cressington 108 coater range highlighted the need for an accurate and inexpensive film thickness monitor. This requirement was met successfully by the development of the MTM-10. More than 30% of Cressington's desktop low vacuum coaters are supplied with a thickness monitor.

In 1993 the desktop coater range was expanded to include a high vacuum sputter coater (208HR) and a high vacuum carbon evaporator (208C). With the increased use of high resolution FE-SEM the market for these coaters is still growing. The 208HR is regarded as the industry standard for FE-SEM sputter coating.

1999 saw the introduction of a new coater with the popular 12" chamber size (308R). The highly adaptable format of the 308R immediately found applications in advanced sample preparation for FE-SEM and TEM and in many areas of thin film R & D. This coater is unusual in being able to combine sputtering and high vacuum evaporation in a single vacuum cycle. The range of accessories and chamber formats for the 308R is the subject of ongoing development.

Cressington currently offers a wide selection of desktop coaters. Sputter coaters range from simple low vacuum gold coaters for SEM to complex high vacuum multi-head sputter coaters for R & D. Evaporators range from low vacuum carbon coaters to multi-material coaters with mixed EB and resistive sources. Although the freeze-etch technique is no longer in widespread use, it can still offer significant advantages to specialist researchers, and the current desktop model is still available on special request.

Cressington is committed to a continuous research and product development program to improve the performance of the coating range. The latest 308R offers a combination of turbo-pumping and cryo-pumping to give an ultimate pressure in the high 10-8mb range. Initial tests show that this ultra-clean and ultra-dry vacuum environment gives significant benefits in the properties of sputtered layers.


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